Time-resolved evolution of collisional transient sheath in plasma source ion implantation

In this work, an analytical model for the time-resolved dynamics of the collisional transient sheath in the plasma source ion implantation (PSII) process is developed. The presented model can forecast the temporal dependence of the implanted ion flux and sheath width in the collisional transient sheath. During the PSII process, the effects of some physical parameters such as